首页>
外国专利>
PROCESSES FOR MONITORING THE LEVELS OF OXYGEN AND/OR NITROGEN SPECIES IN A SUBSTANTIALLY OXYGEN AND NITROGEN-FREE PLASMA ASHING PROCESS
PROCESSES FOR MONITORING THE LEVELS OF OXYGEN AND/OR NITROGEN SPECIES IN A SUBSTANTIALLY OXYGEN AND NITROGEN-FREE PLASMA ASHING PROCESS
展开▼
机译：监测基本氧和无氮等离子体灰化过程中氧和/或氮物种水平的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Processes for monitoring the levels of oxygen and/or nitrogen in a substantially oxygen and nitrogen-free plasma ashing process generally includes monitoring the plasma using optical emission. An effect produced by the low levels of oxygen and/or nitrogen species present on other species generally abundant in the plasma is monitored and correlated to amounts of oxygen and nitrogen present in the plasma. This so-called ''effect detection'' process monitors perturbations in the spectra specifically associated with species other than nitrogen and/or oxygen due to the presence of trace amounts of oxygen and/or nitrogen species and is used to quantitatively determine the amount of oxygen and/or nitrogen at a sensitivity on the order of 1 part per million and potentially 1part per billion.
展开▼
