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Photomask data generation method, photomask generation method, exposure method, and device manufacturing method
Photomask data generation method, photomask generation method, exposure method, and device manufacturing method
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机译：光掩模数据生成方法，光掩模生成方法，曝光方法和器件制造方法
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摘要
A method for generating original plate data includes calculating a two-dimensional transmission cross coefficient based on a function indicating an intensity distribution of light formed on a pupil plane of a projection optical system with illumination light and a pupil function for the projection optical system, calculating an approximate aerial image obtained by approximating an aerial image on an image plane of the projection optical system by at least one component of a plurality of components of the aerial image based on the two-dimensional transmission cross coefficient and a first pattern on an object plane of the projection optical system, generating a further pattern having the first pattern on the object plane and auxiliary patterns based on the approximate aerial image, and generating original plate data including a pattern generated by repeating the calculating and generating processing by using the further pattern generated by the generating processing as the first pattern on the object plane.
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