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MOLECULAR BEAM EPITAXY (MBE) GROWTH OF SEMI-INSULATING C-DOPED GAN
MOLECULAR BEAM EPITAXY (MBE) GROWTH OF SEMI-INSULATING C-DOPED GAN
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机译:半绝缘C掺杂GAN的分子束外延(MBE)生长
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摘要
A method of growing semi-insulating GaN epilayers by ammonia- molecular beam epitaxy (MBE) through intentional doping with carbon is described. Thick GaN layers of high resistivity are an important element in GaN based heterostructure field- effect transistors. A methane ion source is preferably used as the carbon dopant source.
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