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Large area electron emission system for application in mask-based lithography, maskless lithography II and microscopy
Large area electron emission system for application in mask-based lithography, maskless lithography II and microscopy
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机译：大面积电子发射系统，用于基于掩模的光刻，无掩模光刻II和显微镜
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摘要
The present invention relates to a various systems for generating and directing electron flow, and related methods, manufacturing techniques and related componentry, such as can be used in lithography, microscopy and other applications. In one embodiment, the present invention involves a system that includes an electron source having a plurality of independently-actuatable emission surfaces each of which is capable of emitting electrons, and an optical column adjacent to the electron source through which the emitted electrons pass. The optical column includes a plurality of actuatable electrodes that are capable of influencing paths taken by the emitted electrons.
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