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DEFECT INSPECTION METHOD OF GRAY TONE MASK AND DEFECT INSPECTION APPARATUS, DEFECT INSPECTION METHOD OF PHOTOMASK, MANUFACTURING METHOD OF GRAY TONE MASK AND PATTERN TRANSFER METHOD
DEFECT INSPECTION METHOD OF GRAY TONE MASK AND DEFECT INSPECTION APPARATUS, DEFECT INSPECTION METHOD OF PHOTOMASK, MANUFACTURING METHOD OF GRAY TONE MASK AND PATTERN TRANSFER METHOD
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机译：灰色口罩的缺陷检查方法和缺陷检查装置，光罩的缺陷检查方法，灰色口罩的制造方法和图案转移方法
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摘要
A method for inspecting a defect of a gray tone mask is provided to obtain a gray tone mask having undergone a high-reliable defect inspection process by irradiating exposure light to a gray tone mask so that a pattern formed in the mask is transferred to an object. A gray tone mask includes a light preventing part, a light transmitting part and a light half-transmitting part as a region whose transmission quantity is adjusted to selectively vary the thickness of a photoresist layer on an object to be transferred. The light half-transmitting part has a region having a fine mask pattern not greater than a resolution limit in an exposure condition in which the gray tone mask is used. The light half-transmitting part is injected to obtain a transmission signal. The transmission signal is compared with allowable transmission value in a previously installed light half-transmitting part to determine whether the light half-transmitting part is defective. In the process for obtaining the transmission signal, the light half-transmitting part is irradiated by a predetermined light source(21), a predetermined quantity defocused from a just focus is photographed by a photograph unit(24) by using transmission flux having transmitted the light half-transmitting part, and the transmission signal is obtained from a photographed image.
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