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Computer aided modeling, reliability checking and verification of a lithography process using a calibrated eigen decomposition model
Computer aided modeling, reliability checking and verification of a lithography process using a calibrated eigen decomposition model
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机译:使用校准的特征分解模型对光刻工艺进行计算机辅助建模,可靠性检查和验证
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摘要
A method for modeling a photolithography process which includes the steps of generating a calibrated model of the photolithography process capable of estimating an image to be produced by the photolithography process when utilized to image a mask pattern containing a plurality features; and determining an operational window of the calibrated model, which defines whether or not the calibrated model can accurately estimate the image to be produced by a given feature in the mask pattern.
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