首页> 外国专利> X-ray reflector exhibiting taper, method of making same, narrow band x-ray filters including same, devices including such filters, multispectral x-ray production via unispectral filter, and multispectral x-ray production via multispectral filter

X-ray reflector exhibiting taper, method of making same, narrow band x-ray filters including same, devices including such filters, multispectral x-ray production via unispectral filter, and multispectral x-ray production via multispectral filter

机译:具有锥形的X射线反射器,其制造方法,包括该X射线反射器的窄带X射线滤光器,包括这种滤光器的装置,通过单光谱滤光器产生多光谱X射线以及通过多光谱滤光器产生多光谱X射线

摘要

An x-ray reflector may include: a substrate; a first layer formed on the substrate, the first layer including a relatively higher-Z material, where Z represents the atomic number; and a second layer formed on the first layer, the second layer including a relatively lower-Z material; at least one of the first layer and the second layer exhibiting a taper in an axial direction extending between a first end of the substrate and a second end of the substrate.
机译:X射线反射器可以包括:基板;第一层,形成在基板上,第一层包括相对较高Z的材料,其中Z表示原子序数;第二层形成在第一层上,第二层包括相对较低Z的材料;所述第一层和所述第二层中的至少一个在轴向方向上呈现锥形,所述锥形在基板的第一端与基板的第二端之间延伸。

著录项

  • 公开/公告号US7315611B2

    专利类型

  • 公开/公告日2008-01-01

    原文格式PDF

  • 申请/专利权人 YONG MIN CHO;THOMAS JOSEPH FOX;

    申请/专利号US20050139655

  • 发明设计人 YONG MIN CHO;THOMAS JOSEPH FOX;

    申请日2005-05-31

  • 分类号G21K3;

  • 国家 US

  • 入库时间 2022-08-21 20:09:11

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