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METHOD FOR FABRICATING NONLINEAR ELEMENT, NONLINEAR ELEMENT, AND ELECTRO-OPTIC DEVICE

机译:制造非线性元件,非线性元件和光电器件的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for fabricating a nonlinear element in which nitrogen can be distributed suitably over the entire thickness direction of a tantalum oxide film when a tantalum oxide film containing hydrogen and nitrogen is employed as an insulating layer, to provide a nonlinear element, and to provide an electro-optic device.;SOLUTION: When a nonlinear element 10x is fabricated, a tantalum oxide film 13 containing nitrogen and an aluminum film 17 containing nitrogen are formed and a lower electrode 13x is patterned. Anodic oxidation is then performed using the lower electrode 13x as anode to transform an aluminum film 17x containing nitrogen into an aluminum oxide film 18x and to form tantalum oxide films 14y and 14z containing nitrogen, as an insulating layer 14x, at the upper surface portion and the side face portion of the lower electrode 13x. Subsequently, the aluminum oxide film 18x containing nitrogen is removed by etching and hydrogen is introduced to the insulating layer 14x. Finally, an upper electrode 15x is formed.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种制造非线性元件的方法,其中当使用包含氢和氮的氧化钽膜作为绝缘层时,可以在氧化钽膜的整个厚度方向上适当地分布氮。解决方案:当制造非线性元件10x时,形成包含氮的氧化钽膜13和包含氮的铝膜17,并对下部电极13x进行构图。然后使用下电极13x作为阳极进行阳极氧化,以将包含氮的铝膜17x转变为氧化铝膜18x,并在上表面部分和下表面形成包含氮的钽氧化物膜14y和14z作为绝缘层14x。下电极13x的侧面部分。随后,通过蚀刻去除包含氮的氧化铝膜18x,并且将氢引入绝缘层14x。最后,形成上部电极15x 。;版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2008108934A

    专利类型

  • 公开/公告日2008-05-08

    原文格式PDF

  • 申请/专利权人 EPSON IMAGING DEVICES CORP;

    申请/专利号JP20060290802

  • 发明设计人 NAGANO DAISUKE;

    申请日2006-10-26

  • 分类号H01L49/02;G02F1/1365;

  • 国家 JP

  • 入库时间 2022-08-21 20:20:00

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