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Method and apparatus for reduction of systematic measurement errors in the case of the microscopic examination of objects
Method and apparatus for reduction of systematic measurement errors in the case of the microscopic examination of objects
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机译：在物体的微观检查中减少系统测量误差的方法和装置
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摘要
In the manufacture of semiconductor components, the structures are usually manufactured in different planes. In the case of the orientation of these planes to one another is, among other things, a displacement or alignment and investigated as an overlay - error is detected. For reducing a systematic measurement error, a measuring arrangement (10) for measuring the overlay - error proposed. This has a lighting device (12), an objective lens (14) for focusing a radiation of the illuminating device (12) on the object (16) and a tube lens (18) for mapping of the radiation on a sensor unit (20) on. In the beam path of the measuring arrangement (10) is a compensator (22) is provided, in which the wave fronts of the incident radiation be tilted differently spectrally, so that a compensation of the axial transverse chromatic aberration, takes place.
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