首页> 外国专利> SYSTEM AND METHOD FOR IMPROVING LINEWIDTH CONTROL IN A LITHOGRAPHY DEVICE BY VARYING THE ANGULAR DISTRIBUTION OF LIGHT IN AN ILLUMINATOR AS A FUNCTION OF FIELD POSITION

SYSTEM AND METHOD FOR IMPROVING LINEWIDTH CONTROL IN A LITHOGRAPHY DEVICE BY VARYING THE ANGULAR DISTRIBUTION OF LIGHT IN AN ILLUMINATOR AS A FUNCTION OF FIELD POSITION

机译:通过改变照明器中光的角分布作为场位置的功能来改善光刻设备中线宽控制的系统和方法

摘要

Electromagnetic energy is emitted from the illumination source of a lithographic apparatus. Some of the emitted electromagnetic energy passes through an illumination optics module. Illumination optics module includes a one-dimensional optical converter having a pew pilmyeon (pupil plane). Adjust the opening device having a possible numerical aperture is positioned close to, Pew pilmyeon a part of the electromagnetic energy received by the one-dimensional optical converter to pass through the opening of the opening device. Angular distribution of electromagnetic energy passes through an illumination optics module is controlled as a function of illumination field position using an opening device, thereby improving the line width control of a lithographic apparatus. ; A lithographic apparatus, a projection optics module, a line width control
机译:从光刻设备的照明源发射电磁能。某些发射的电磁能通过照明光学模块。照明光学模块包括具有皮毛皮毛虫(瞳孔平面)的一维光学转换器。调节具有可能的数值孔径的打开装置的位置,使其靠近一球光学器件接收的一部分电磁能,使其通过打开装置的开口。使用打开装置,根据照明场位置控制通过照明光学模块的电磁能的角分布,从而改善了光刻设备的线宽控制。 ;光刻设备,投影光学模块,线宽控制

著录项

  • 公开/公告号KR100733547B1

    专利类型

  • 公开/公告日2007-06-28

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20030025335

  • 申请日2003-04-22

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 20:31:50

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