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SYSTEM AND METHOD FOR IMPROVING LINEWIDTH CONTROL IN A LITHOGRAPHY DEVICE BY VARYING THE ANGULAR DISTRIBUTION OF LIGHT IN AN ILLUMINATOR AS A FUNCTION OF FIELD POSITION
SYSTEM AND METHOD FOR IMPROVING LINEWIDTH CONTROL IN A LITHOGRAPHY DEVICE BY VARYING THE ANGULAR DISTRIBUTION OF LIGHT IN AN ILLUMINATOR AS A FUNCTION OF FIELD POSITION
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机译:通过改变照明器中光的角分布作为场位置的功能来改善光刻设备中线宽控制的系统和方法
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摘要
Electromagnetic energy is emitted from the illumination source of a lithographic apparatus. Some of the emitted electromagnetic energy passes through an illumination optics module. Illumination optics module includes a one-dimensional optical converter having a pew pilmyeon (pupil plane). Adjust the opening device having a possible numerical aperture is positioned close to, Pew pilmyeon a part of the electromagnetic energy received by the one-dimensional optical converter to pass through the opening of the opening device. Angular distribution of electromagnetic energy passes through an illumination optics module is controlled as a function of illumination field position using an opening device, thereby improving the line width control of a lithographic apparatus. ; A lithographic apparatus, a projection optics module, a line width control
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