首页> 外国专利> MANUFACTURING METHOD OF LOW-k PLASMA POLYMERIZED THIN FILMS AND LOW-k THIN FILMS MANUFACTURED THEREFROM

MANUFACTURING METHOD OF LOW-k PLASMA POLYMERIZED THIN FILMS AND LOW-k THIN FILMS MANUFACTURED THEREFROM

机译:低k等离子聚合薄膜的制造方法及由其制得的低k薄膜

摘要

A method for manufacturing a low-k plasma-polymerized thin film and a low-k thin film are provided to improve a dielectric constant by using a plasma processing method or a thermal processing method. A precursor including deca-mesyl-cyclo-pentasil-oxane and cyclo-hexane is evaporated within bubblers(30,31) to evaporate a precursor solution. The evaporated precursor is discharged from the bubblers. The discharged precursor is induced into a reactor(50) for plasma deposition. A plasma-polymerized thin film is deposited on an upper surface of a substrate by using the plasma of the reactor.
机译:提供了一种用于制造低k等离子体聚合薄膜的方法和一种低k薄膜,以通过使用等离子体处理方法或热处理方法来改善介电常数。在鼓泡器(30,31)中蒸发包括十-甲酰基-环-戊基-戊烷和环己烷的前体,以蒸发前体溶液。蒸发的前体从起泡器中排出。将排出的前体引入反应器(50)以进行等离子体沉积。通过使用反应器的等离子体,将等离子体聚合的薄膜沉积在基板的上表面上。

著录项

  • 公开/公告号KR100697669B1

    专利类型

  • 公开/公告日2007-03-20

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20050126703

  • 发明设计人 양재영;이성우;정동근;

    申请日2005-12-21

  • 分类号H01L21/205;

  • 国家 KR

  • 入库时间 2022-08-21 20:32:37

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号