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MANUFACTURING METHOD OF LOW-k PLASMA POLYMERIZED THIN FILMS AND LOW-k THIN FILMS MANUFACTURED THEREFROM
MANUFACTURING METHOD OF LOW-k PLASMA POLYMERIZED THIN FILMS AND LOW-k THIN FILMS MANUFACTURED THEREFROM
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机译:低k等离子聚合薄膜的制造方法及由其制得的低k薄膜
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摘要
A method for manufacturing a low-k plasma-polymerized thin film and a low-k thin film are provided to improve a dielectric constant by using a plasma processing method or a thermal processing method. A precursor including deca-mesyl-cyclo-pentasil-oxane and cyclo-hexane is evaporated within bubblers(30,31) to evaporate a precursor solution. The evaporated precursor is discharged from the bubblers. The discharged precursor is induced into a reactor(50) for plasma deposition. A plasma-polymerized thin film is deposited on an upper surface of a substrate by using the plasma of the reactor.
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