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PLASMA TREATMENT CHAMBER, ELECTRICAL POTENTIAL CONTROL DEVICE, ELECTRICAL POTENTIAL CONTROL METHOD, PROGRAM AND STORAGE MEDIUM
PLASMA TREATMENT CHAMBER, ELECTRICAL POTENTIAL CONTROL DEVICE, ELECTRICAL POTENTIAL CONTROL METHOD, PROGRAM AND STORAGE MEDIUM
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机译：等离子体处理室，电势控制装置，电势控制方法，程序和存储介质
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摘要
PROBLEM TO BE SOLVED: To provide a plasma treatment chamber in which the amount of attached polymer is easily controlled with a simple constitution.;SOLUTION: The plasma treatment chamber 10 has a cylindrical side wall member 45 covering an inner peripheral surface of a vessel 11. An electrical potential control device 46 is provided with a grounded conducting member 47 which moves up and down in contact to or in noncontact to the side wall member 45. In an RIE process, by moving the conducting member 47 down to bring into contact to the side wall member 45, an electric potential of the side wall member 45 is set at a ground potential. In an ashing process, by moving the conducting member 47 up to leave the wide wall member 45, the electric potential of the side wall member 45 is set at a floating potential.;COPYRIGHT: (C)2007,JPO&INPIT
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