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SPUTTERING TARGET FOR HIGHLY RESISTANT TRANSPARENT CONDUCTIVE FILM, AND HIGHLY RESISTANT TRANSPARENT CONDUCTIVE FILM, AND MANUFACTURING METHOD OF HIGHLY RESISTANT TRANSPARENT CONDUCTIVE FILM
SPUTTERING TARGET FOR HIGHLY RESISTANT TRANSPARENT CONDUCTIVE FILM, AND HIGHLY RESISTANT TRANSPARENT CONDUCTIVE FILM, AND MANUFACTURING METHOD OF HIGHLY RESISTANT TRANSPARENT CONDUCTIVE FILM
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机译：高电阻透明导电膜，高电阻透明导电膜的溅射靶及高电阻透明导电膜的制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a sputtering target for a highly resistant transparent conductive film which can be basically used by a DC magnetron sputtering apparatus, and deposit a transparent and highly resistant film, a highly resistant transparent conductive film using the same; and to provide a manufacturing method thereof.;SOLUTION: The sputtering target for the highly resistant transparent conductive film to deposit the highly resistant transparent conductive film with the resistivity of about 0.9 10-3 to 10 10-3cm contains indium oxide and tin oxide as necessary, and also contains a silicon oxide, in which the relative density is 100% and the Fc density is confined to 15 ppm.;COPYRIGHT: (C)2007,JPO&INPIT
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