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Excess film emending method for e.g. dynamic RAM, involves providing simulation model with regulation algorithm, determining offset values for samples, and determining parameter of algorithm for illumination device on basis of offset values
Excess film emending method for e.g. dynamic RAM, involves providing simulation model with regulation algorithm, determining offset values for samples, and determining parameter of algorithm for illumination device on basis of offset values
The method involves exposing two samples with gauge marks to exposure fields. A simulation model with a regulation algorithm is provided in an illumination device for correction of inter field errors arising out during exposure of the samples. A set of offset values is determined for the two samples, and a parameter of the regulation algorithm is determined for the illumination device on basis of the offset values.
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