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DRY ETCHING APPARATUSES AND DRY ETCHING END-POINT DETECTION APPARATUSES USED IN A BOSCH PROCESS AND METHODS OF FORMING AN ELECTRIC DEVICE BY USING DRY ETCHING APPARATUSES THEREOF
DRY ETCHING APPARATUSES AND DRY ETCHING END-POINT DETECTION APPARATUSES USED IN A BOSCH PROCESS AND METHODS OF FORMING AN ELECTRIC DEVICE BY USING DRY ETCHING APPARATUSES THEREOF
And it provides the dry etching process used in the Bosch (Bosch Process) devices, dry-etching end point detection apparatus and methods for using them to form an electrical component. The etching apparatuses, by using the dry-etching end point detection device, and them to methods of forming electrical devices separate the plasma light having an etching information of the substrate during the etching and deposition processes are performed repeatedly to manufacture the electric device to efficiently It helps provide a solution. To this end, the processing chamber is prepared. The optical window is arranged in the side wall of the process chamber. The optical window is thereby project the light out of the plasma process chamber during an etching and deposition process of the Bosch process. It is arranged for the optical focusing around the optical window. The light focusing portion of light trapping a plasma etch or deposition process. For the optical analysis electrically connected to the optical focusing unit it is arranged. The light analyzing unit to analyze the plasma light is converted into an optical image. ; Dry etching apparatus, a process chamber, the Bosch process, a plasma light.
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