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System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks
System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks
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机译:用于模拟二进制,衰减相移和交替相移掩模的无掩模光刻的系统,装置和方法
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摘要
A tilting mirror design for maskless lithography is proposed. In this mirror, the tilting portion occupies about 60% of the entire element area. The surrounding space is made 100% reflective and out-of-phase with respect to the tilting portion. The ratio between the tilting portion of the mirror and the out-of-phase portion is optimized in order to result in equal positive and negative maximum amplitudes over a complete range of tilt angles.
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