首页> 外国专利> MEASUREMENT CONDITION OPTIMIZING METHOD, POSITION MEASURING METHOD USING THE SAME, POSITIONING METHOD USING THE SAME, DEVICE MANUFACTURING METHOD USING THE SAME, MEASUREMENT CONDITION OPTIMIZING SYSTEM, POSITION MEASURING DEVICE USING THE SAME, EXPOSURE DEVICE USING THE SAME

MEASUREMENT CONDITION OPTIMIZING METHOD, POSITION MEASURING METHOD USING THE SAME, POSITIONING METHOD USING THE SAME, DEVICE MANUFACTURING METHOD USING THE SAME, MEASUREMENT CONDITION OPTIMIZING SYSTEM, POSITION MEASURING DEVICE USING THE SAME, EXPOSURE DEVICE USING THE SAME

机译:测量条件优化方法,使用相同的位置测量方法,使用相同的位置测量方法,使用相同的设备制造方法,测量条件优化系统,使用相同的位置测量设备,使用相同的曝光设备

摘要

PROBLEM TO BE SOLVED: To provide a measurement condition optimizing method for reducing a time and labor and optimizing a measurement condition.;SOLUTION: The measurement condition which is default-set is set (step S101). EGA measurement is performed on each wafer W. An ALG simulator 210 reads an EGA measurement result, the number of sample shots is set as a parameter (measurement condition) of simulation (step S102), for example, and the ALG simulator 210 performs simulation. An EGA calculation result in the number of sample shots is obtained on each wafer W. An evaluation value is obtained based on the EGA calculation result (step S103). Dispersion degrees of the evaluation values are compared between the wafers W (step S104). The presence or absence of a significance difference between dispersions is determined. When the significance difference exists, the number of sample shots where dispersion becomes minimum is selected as an optimum measurement condition. When the significance difference does not exist, the number of the sample shots which are most advantageous in terms of throughput is selected (step S105).;COPYRIGHT: (C)2006,JPO&NCIPI
机译:要解决的问题:提供一种用于减少时间和劳力并优化测量条件的测量条件优化方法。解决方案:设置默认设置的测量条件(步骤S101)。在每个晶片W上执行EGA测量。例如,ALG模拟器210读取EGA测量结果,将样本拍摄数量设置为模拟的参数(测量条件)(步骤S102),并且ALG模拟器210执行模拟。 。在每个晶片W上获得样本数量的EGA计算结果。基于EGA计算结果获得评估值(步骤S103)。比较晶片W之间的评价值的分散度(步骤S104)。确定分散体之间是否存在显着性差异。当存在显着性差异时,选择色散最小的样本数量作为最佳测量条件。当不存在显着性差异时,选择在吞吐量方面最有利的样本拍摄数量(步骤S105)。版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006140204A

    专利类型

  • 公开/公告日2006-06-01

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20040326441

  • 发明设计人 OKAMOTO HIROKI;

    申请日2004-11-10

  • 分类号H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 21:53:16

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