HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS;GUO WEI AND METHODS OF MAKING SPUTTERING COMPONENTS

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• 2. 高纯镍/钒溅射构件和制备溅射构件的方法 [P] . 中国专利： CN1723292A . 2006-01-18
• 3. HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS; AND METHODS OF MAKING SPUTTERING COMPONENTS [P] . 欧洲知识产权局专利： EP1579019A2 . 2005-09-28

  机译： 高纯镍/钒溅射成分;和制造溅射成分的方法

• 4. HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS; AND METHODS OF MAKING SPUTTERING COMPONENTS [P] . SG112629A1 . 2005-07-28

  机译： 高纯镍/钒溅射成分;和制造溅射成分的方法

• 5. HIGH PURITY NICKEL/VANADIUM SPUTTERING COMPONENTS; AND METHODS OF MAKING SPUTTERING COMPONENTS [P] . 世界知识产权组织专利： WO2004052785B1 . 2005-07-21

  机译： 高纯镍/钒溅射成分;和制造溅射成分的方法

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