首页> 外国专利> EXPOSURE METHOD OF PATTERN FORMED ON ORIGINAL PLATE ONTO BODY THROUGH PROJECTION OPTICAL SYSTEM BY COLLECTING RELATIONSHIP AMONG EXPOSURE AMOUNT, FOCUS STATE AND PATTERN SHAPE FORMED ON FIRST BODY, OBTAINING INFORMATION OF RESIST COATED ON SECOND BODY AND TRANSFERRING THE PATTERN TO SECOND BODY ACCORDING TO THE EXPOSURE AMOUNT AND FOCUS STATE DETERMINED FROM THE RELATIONSHIP AND INFORMATION, DATABASE, AND PREPARATION METHOD OF DEVICE USING THE METHOD

EXPOSURE METHOD OF PATTERN FORMED ON ORIGINAL PLATE ONTO BODY THROUGH PROJECTION OPTICAL SYSTEM BY COLLECTING RELATIONSHIP AMONG EXPOSURE AMOUNT, FOCUS STATE AND PATTERN SHAPE FORMED ON FIRST BODY, OBTAINING INFORMATION OF RESIST COATED ON SECOND BODY AND TRANSFERRING THE PATTERN TO SECOND BODY ACCORDING TO THE EXPOSURE AMOUNT AND FOCUS STATE DETERMINED FROM THE RELATIONSHIP AND INFORMATION, DATABASE, AND PREPARATION METHOD OF DEVICE USING THE METHOD

机译：通过收集曝光量，焦点状态和在第一主体上形成的图案形状之间的关系，获取通过在第二主体上形成的抗蚀剂信息并将其转移到第二主体上，从而通过投射光学系统将原始板上的图案曝光到通过光学系统投射到身体上的图案由关系和信息，数据库确定的数量和焦点状态，以及使用该方法的设备制备方法

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摘要

PURPOSE: Provided are a method for exposing a pattern formed on an original plate on a body through a projection optical system for obtaining a micropattern having a cross-section of high quality, a database, and a method for preparing a device by using the method. CONSTITUTION: The exposure method comprises the steps of collecting the relationship among an exposure amount for exposing a first body, a focus state of the first body at the projection optical system, and the pattern shape formed on the first body exposed with the exposure amount and the focus state, every information of resist coated on the first body; collecting the information of resist coated on a second body other than the first body; determining the exposure amount for exposing a second body and a focus state of the second body at the projection optical system, based on the collected relationship and the information of resist coated on the second body; and transferring the pattern formed on an original plate to the second body according to the determined exposure amount and focus state.

机译：目的：提供一种用于通过投影光学系统曝光形成在主体上的原始板上的图案的方法，用于获得具有高质量横截面的微图案的数据库，以及通过使用该方法制备装置的方法。构成：曝光方法包括以下步骤：收集用于曝光第一物体的曝光量，第一物体在投影光学系统上的聚焦状态以及在第一物体上形成的图案形状之间的关系。聚焦状态，将抗蚀剂的所有信息涂覆在第一物体上;收集涂覆在除第一主体之外的第二主体上的抗蚀剂的信息;基于收集的关系和涂覆在第二物体上的抗蚀剂的信息，确定用于在投影光学系统上曝光第二物体的曝光量和第二物体的聚焦状态;根据确定的曝光量和聚焦状态，将形成在原版上的图案转印到第二主体上。

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公开/公告号KR20050021971A

专利类型
公开/公告日2005-03-07

原文格式PDF
申请/专利权人 CANON KABUSHIKI KAISHA;
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申请/专利号KR20040068559
发明设计人 SENTOKU KOICHI;
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申请日2004-08-30
分类号G03F7/20;
国家 KR
入库时间 2022-08-21 22:05:43

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