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PROCESSING DEVICE MULTIVARIATE ANALYSIS MODEL CREATION METHOD, PROCESSING DEVICE MULTIVARIATE ANALYSIS METHOD, PROCESSING DEVICE CONTROL DEVICE, PROCESSING DEVICE CONTROL SYSTEM
PROCESSING DEVICE MULTIVARIATE ANALYSIS MODEL CREATION METHOD, PROCESSING DEVICE MULTIVARIATE ANALYSIS METHOD, PROCESSING DEVICE CONTROL DEVICE, PROCESSING DEVICE CONTROL SYSTEM
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机译：加工设备多元分析模型的创建方法，加工设备多元分析方法，加工设备控制设备，加工设备控制系统
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摘要
Detection data detected from a plurality of sensors when a plasma processing device (100A) as a reference and a plasma processing device (100B) of the same type are operated by first setting data are subjected to multivariate analysis so as to create respective multivariate analysis models. After this, when operated by new second setting data, detection data detected from a plurality of sensors of the plasma processing device (100A) are used to create its multivariate analysis model. By using the multivariate analysis model of the plasma processing device (100A) of the second setting data and the multivariate analysis model of the plasma processing device (100B), a multivariate analysis model of the plasma processing device (100B) corresponding to the new second setting data is created. According to this method, for example, even if there is a process characteristic difference between processing devices, a model created for one of the processing devices can be applied directly to another processing device of he same type. Accordingly, there is no need of acquiring data to create a model for each of the processing devices. Thus, it is possible to save labor and reduce the labor hour when creating a model.
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