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THE USE OF A LAYOUT-OPTIMIZATION TOOL TO INCREASE THE YIELD AND RELIABILITY OF VLSI DESIGNS

机译:使用布局优化工具来提高VLSI设计的成品率和可靠性

摘要

The invention provides a method and structure for optimizing placement of redundant vias within an integrated circuit design. The invention first locates target vias by determining which vias do not have a redundant via. Then, the invention draws marker shapes on or adjacent to the target vias. The marker shapes are only drawn in a horizontal or vertical direction from each of the target vias. Next, the invention simultaneously expands all of the marker shapes in the first direction to a predetermined length or until the marker shapes reach the limits of a ground rule. During the expanding, different marker shapes will be expanded to different lengths. The invention determines which of the marker shapes were expanded sufficiently to form a valid redundant via to produce a first set of potential redundant vias and the invention eliminates marker shapes that could not be expanded sufficiently to form a valid redundant via. The invention repeats the foregoing processing in the direction perpendicular to the first. The invention can also be used to eliminate certain undesirable structures such as stacked vias or can be used to fix other problems such as insufficient via-to-via spacing. The invention then adds the redundant vias to the integrated circuit design, according to output produced by the optimizer.
机译:本发明提供一种用于在集成电路设计内优化冗余通孔的放置的方法和结构。本发明首先通过确定哪些通孔不具有冗余通孔来定位目标通孔。然后,本发明在目标通孔上或附近绘制标记形状。仅从每个目标过孔沿水平或垂直方向绘制标记形状。接下来,本发明同时在第一方向上将所有标记形状扩展到预定长度,或者直到标记形状达到基本规则的极限为止。在扩展过程中,不同的标记形状将扩展为不同的长度。本发明确定哪些标记形状被充分扩展以形成有效的冗余通孔以产生第一组潜在的冗余通孔,并且本发明消除了不能充分扩展以形成有效的冗余通孔的标记形状。本发明在垂直于第一方向的方向上重复上述处理。本发明还可以用于消除某些不希望的结构,例如堆叠的通孔,或者可以用于解决其他问题,例如通孔间距不足。然后,根据优化器产生的输出,本发明将冗余通孔添加到集成电路设计中。

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