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Process method of photoresist field board, production method of field board for record medium and production method of record medium, photoresist field board, field board and record medium for record medium
Process method of photoresist field board, production method of field board for record medium and production method of record medium, photoresist field board, field board and record medium for record medium
In record medium, unevenness pattern after the developing it is process method of the photoresist field board whose it is possible to make minute and uniform width, production method of the field board for record medium, and production method of record medium even with when the laser whose wave length is long relatively high accuracy the pre- pit is formed at the time of, is used. Photoresist field board 108 light absorption layer 108b and photosensitive material layer 108c is laminated by order on glass baseplate, 108a is exposed due to the fact that laser beam 102 condenses in photosensitive material layer 108c, the unevenness pattern which corresponds to the pre- pit is formed. For example the pit length which it should form when it is shorter than 4T, as, it changes the duty ratio in the pulse signal line which is input into strength modulator 109 in the abbreviation 50% - 65% range, pit length of the pre- pit becomes short the pulse signal line whose duty ratio is high is formed, when pit length is above 4T, duty ratio forms the fixed pulse signal line with the pit length of the pre- pit, modulates the aforementioned laser beam on the basis of the particular pulse signal line.
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