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Thin film measurement using X-ray fluoroscopy, e.g. for measurement of the thickness of a galvanized layer, whereby a diaphragm for shaping an X-ray examination beam is matched to the geometry of the component to be examined
Thin film measurement using X-ray fluoroscopy, e.g. for measurement of the thickness of a galvanized layer, whereby a diaphragm for shaping an X-ray examination beam is matched to the geometry of the component to be examined
Device for measuring the thickness of thin films using X-ray fluoroscopy has an X-ray tube and a diaphragm device (17) placed between it and a layer to be measured. The diaphragm device comprises an X-ray absorbing zone (26) and an opening (28). The geometry of the opening is such that it is at least partially matched to the geometry of the layer to be measured.
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