首页> 外国专利> Production of a stabilized thin layer of silica doped with silica oxyfluoride for ophthalmic applications, by vapor phase deposition of a protective layer of silica or metal oxide with ionic bombardment

Production of a stabilized thin layer of silica doped with silica oxyfluoride for ophthalmic applications, by vapor phase deposition of a protective layer of silica or metal oxide with ionic bombardment

机译:通过用离子轰击气相沉积二氧化硅或金属氧化物的保护层,生产用于眼科应用的掺杂有氟氧化硅的稳定化二氧化硅薄层

摘要

The production of a stabilized thin layer of silica doped with SiOxFy fluorite comprises the formation, on a layer of silica oxyfluoride, of a protective layer of silica and/or a metal oxide by vapor phase deposition with ionic assistance consisting of bombarding the layer during formation with a beam of positive ions formed from a rare gas, oxygen or a mixture of the two or more of these gases. Independent claims are also included for: (a) a stabilized thin layer of silica doped with silica oxyfluoride produced by this method; (b) a multi-layer anti-glare coating incorporating such a stabilized thin layer; (c) an ophthalmic lens of organic glass including the anti-glare coating.
机译:掺杂有SiOxFy萤石的稳定化二氧化硅薄层的生产包括在氟氧化硅层上通过气相沉积在离子辅助下通过气相沉积形成二氧化硅和/或金属氧化物的保护层,包括在形成过程中轰击该层。用稀有气体,氧气或这些气体中的两种或更多种的混合物形成的正离子束。还包括以下独立权利要求:(a)用该方法生产的掺杂有氟氧化硅的稳定的二氧化硅薄层; (b)包含这种稳定的薄层的多层防眩涂层; (c)包括防眩涂层的有机玻璃眼镜片。

著录项

  • 公开/公告号FR2843407A1

    专利类型

  • 公开/公告日2004-02-13

    原文格式PDF

  • 申请/专利权人 ESSILOR INT;

    申请/专利号FR20020010112

  • 申请日2002-08-08

  • 分类号C23C14/10;C23C14/24;C03C17/245;B32B7/00;G02B1/11;G02C7/04;

  • 国家 FR

  • 入库时间 2022-08-21 22:39:28

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