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Physical and electrical characterizations of ultrathin Si-rich Hf-silicate film and Hf-silicate/SiO2 bilayer deposited by atomic layer chemical vapor deposition

机译：用原子层化学气相沉积沉积超薄Si的HF硅酸盐膜和HF硅酸盐/ SiO2双层的物理和电气特性

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Jaehyun Kim; Kijung Yong;
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年度 2006
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1. Physical and electrical characterizations of ultrathin Si-rich Hf-silicate film and Hf-silicate/SiO_2 bilayer deposited by atomic layer chemical vapor deposition [J] . Jaehyun Kim, Kijung Yong Journal of Applied Physics . 2006,第4期

机译：原子层化学气相沉积法沉积超薄富硅H化硅酸盐薄膜和H化硅酸盐/ SiO_2双层的物理和电学特征
2. Photoelectron spectroscopic analysis of Hf-silicate/SiO2/Si stacks deposited by atomic layer chemical vapor deposition [J] . Kim J, Yong KJ Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2006,第3期

机译：原子层化学汽相沉积Hf-硅酸盐/ SiO2 / Si叠层的光电子能谱分析
3. Characterization of the Ultrathin $hbox{HfO}_{2}$ and Hf-Silicate Films Grown by Atomic Layer Deposition [J] . Tze Chiang Chen, Cheng-Yi Peng, Chih-Hung Tseng, IEEE Transactions on Electron Devices . 2007,第期

机译：原子层沉积生长的超薄$ hbox {HfO} _ {2} $和Hf硅酸盐薄膜的表征
4. Rapid Thermal Annealing of Hf-silicate/Polysilicon Dielectric Layers Deposited by Atomic Layer Deposition [C] . Z.M.Rittersma, D.Massoubre, F.Roozeboom, The Meeting of the Electrochemical Society . 2003

机译：用原子层沉积沉积的HF硅酸盐/多晶硅介电层的快速热退火
5. Phase-selective synthesis of Tl-Ba-Ca-Cu-O thin films and multilayer structures by metal-organic chemical vapor deposition. Process optimization, phase evolution, electrical characterizations, and microstructural developments. [D] . McNeely, Richard Joseph. 1999

机译：通过金属有机化学气相沉积相选择合成Tl-Ba-Ca-Cu-O薄膜和多层结构。工艺优化，相变，电学表征和微结构发展。
6. ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition [O] . Alireza M. Kia, Nora Haufe, Sajjad Esmaeili, 2019

机译：通过原子层沉积和化学气相沉积在高纵横比结构中沉积的薄膜的ToF-SIMS 3D分析
7. Effect of hydrogen on passivation quality of SiNx/Si-rich SiNx stacked layers deposited by catalytic chemical vapor deposition on c-Si wafers [O] . Trinh Cham Thi, Koichi Koyama, Keisuke Ohdaira, 2015

机译：催化化学气相沉积在C-Si晶圆上沉积的SINX / Si的SINX堆叠层钝化质量的影响
8. In situ Infrared Reflection Absorption Spectroscopic Characterization of Plasma Enhanced Chemical Vapor Deposited SiO2 Films [R] . Koller, K. B., Schmidt, W. A., Butler, J. E. 1988

机译：等离子体增强化学气相沉积siO2薄膜的原位红外反射吸收光谱表征

Physical and electrical characterizations of ultrathin Si-rich Hf-silicate film and Hf-silicate/SiO2 bilayer deposited by atomic layer chemical vapor deposition

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