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DESIGN RULE MANUFACTURING METHOD, DESIGN RULE MANUFACTURING SYSTEM AND RECORDING MEDIA THEREOF
DESIGN RULE MANUFACTURING METHOD, DESIGN RULE MANUFACTURING SYSTEM AND RECORDING MEDIA THEREOF
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机译：设计规则的制作方法，设计规则的制作系统及其记录媒体
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摘要
A method for designing a semiconductor integrated circuit is provided which comprises compacting a design layout of a semiconductor integrated circuit on the basis of a given design rule to obtain a compacted pattern, predicting a pattern to be formed at a surface area of a wafer for forming the semiconductor integrated circuit on the basis of the compacted pattern, obtaining an evaluated value by comparing the predicted pattern with the compacted pattern, deciding whether the evaluated value satisfies a predetermined condition, and modifying the design rule when the evaluated value is decided as not satisfying the predetermined condition.
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