Porous material formation by chemical vapor deposition onto colloidal crystal templates

• 1. 在半导体器件上形成多孔介电材料层的方法及形成的器件 [P] . 中国专利： CN1427456A . 2003-07-02
• 2. 在金属氮化物生长模板层上形成块状III族氮化物材料的方法以及由所述方法形成的结构体 [P] . 中国专利： CN103221586B . 2016.08.10
• 3. Porous material formation by chemical vapor deposition onto colloidal crystal templates [P] . 美国专利： US7112615B2 . 2006-09-26

  机译： 通过化学气相沉积到胶体晶体模板上形成多孔材料

• 4. POROUS MATERIAL FORMATION BY CHEMICAL VAPOR DEPOSITION ONTO COLLOIDAL CRYSTAL TEMPLATES [P] . AU2003302222A1 . 2004-06-30

  机译： 通过在胶状结晶模板上化学气相沉积形成的多孔材料

• 5. POROUS MATERIAL FORMATION BY CHEMICAL VAPOR DEPOSITION ONTO COLLOIDAL CRYSTAL TEMPLATES [P] . 世界知识产权组织专利： WO2004053205A2 . 2004-06-24

  机译： 通过在胶状结晶模板上化学气相沉积形成的多孔材料

• 1. Vapor Phase Polymerization Deposition Conducting Polymer Nanocomposites on Porous Dielectric Surface as High Performance Electrode Materials [J] . Ya jie Yang, Luning Zhang, Shibin Li, 纳微快报：英文版 . 2013,第001期
• 2. Effect of Gas Sources on the Deposition of Nano-Crystalline Diamond Films Prepared by Microwave Plasma Enhanced Chemical Vapor Deposition [J] . WENG Jun, XIONG Liwei, WANG Jianhua, 等离子体科学和技术（英文版） . 2010,第006期
• 3. Preparation of Nano-Crystalline Diamond Films on Poly-Crystalline Diamond Thick Films by Microwave Plasma Enhanced Chemical Vapor Deposition [J] . 熊礼威, 江建华, 满卫东, 等离子体科学和技术：英文版 . 2010,第003期
• 4. InAs quantum dot and nanowhisker formation by metalorganic chemical vapor deposition in porous materials [C] . Yeoh, T.S., Swint, . 2003
• 5. The growth and characterization of III-V compound semiconductor materials by metalorganic chemical vapor deposition and laser photochemical vapor deposition [D] . York, Pamela Kay 1990
• 6. Templated Growth of Crystalline Mesoporous Materials: From Soft/Hard Templates to Colloidal Templates [O] . Lei Zhang, Lei Jin, Ben Liu, 1970
• 7. Preparation and Hydrogen Storage Properties of Zeolite-Templated Carbon Materials Nanocast via Chemical Vapor Deposition: Effect of the Zeolite Template and Nitrogen Doping [O] . -1

• 1. Room Temperature and Reduced Pressure Chemical Vapor Deposition of Silicon Carbide on Various Materials Surface [J] . Hitoshi Habuka ,Asumi Hirooka ,Kohei Shioda . 化学工程与科学期刊（英文） . 2014,第4期
• 2. Fibrous TiO_2 prepared by chemical vapor deposition using activated carbon fibers as template via adsorption,hydrolysis and calcinations [J] . Hui-na YANG ,Li-fen LIU ,Feng-lin YANG . 浙江大学学报（英文版）A辑：应用物理与工程 . 2008,第7期
• 3. 从胶体颗粒、胶体晶体为模板制备中空微球和大孔材料 [C] . 曹维孝 ,丛海林 ,杨凌露 . 2006年全国高分子材料科学与工程研讨会 . 2006
• 4. 胶体晶体模板法制备有序多孔材料的研究 [A] . 周浪 . 2006