首页> 外国专利> Light source using the semiconductor light-emitting device manufacturing method of a group III nitride semiconductor crystal manufacturing method of a gallium nitride-based compound semiconductor, a gallium nitride based compound semiconductor, and the gallium nitride-based compound semiconductor light-emitting device

Light source using the semiconductor light-emitting device manufacturing method of a group III nitride semiconductor crystal manufacturing method of a gallium nitride-based compound semiconductor, a gallium nitride based compound semiconductor, and the gallium nitride-based compound semiconductor light-emitting device

机译:使用基于氮化镓类化合物半导体的III族氮化物半导体晶体的制造方法,氮化镓类化合物半导体和氮化镓类化合物半导体发光器件的半导体发光器件的制造方法的光源

摘要

A method of fabricating a film of group-III nitride semiconductor crystal includes a step of using metal material to deposit particles of a group III metal on a substrate surface in an atmosphere containing a nitrogen source and no metal material, and a step of growing group-III nitride semiconductor crystal on the substrate surface on which the particles have been deposited.
机译:制造III族氮化物半导体晶体的膜的方法包括以下步骤:使用金属材料在不含氮源且不含金属材料的气氛中在基板表面上沉积III族金属的颗粒;以及生长族的步骤。 -III氮化物半导体晶体在其上已沉积颗粒的基板表面上。

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