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Mask for making an optical guide with variable embedding depth e.g. for fibre optic telecommunications, has transition pattern capable of modulating burial electric field applied to guide in transition zone
Mask for making an optical guide with variable embedding depth e.g. for fibre optic telecommunications, has transition pattern capable of modulating burial electric field applied to guide in transition zone
The mask comprises a transition pattern (25b) designed to be aligned with a part of the guide, called transition zone (3b), the pattern being capable of modulating a charging electric field applied to the guide, in the transition zone, the transition pattern including orifices. The transition pattern is disposed between a homogenous pattern of the mask and an opening (5c) of the mask, the transition pattern having a parameter variable between the homogenous pattern and the opening of the mask.
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