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ELECTRODEPOSITED COPPER FOIL WITH ITS SURFACE PREPARED, PROCESS FOR PRODUCING THE SAME AND USE THEREOF

机译:电镀铜箔及其表面,用于生产和使用铜箔的过程

摘要

A process for producing an electrodeposited copper foil with its surface prepared, comprising the steps of: subjecting an electrodeposited copper foil having a shiny side and a matte side whose average surface roughness (Rz) is in the range of 2.5 to 10 mu m to at least one mechanical polishing so that the average surface roughness (Rz) of the matte side becomes in the range of 1.5 to 3.0 mu m; and subjecting the matte side having undergone the mechanical polishing to a selective chemical polishing so that the average surface roughness (Rz) of the matte side becomes in the range of 0.8 to 2.5 mu m. The invention further provides an electrodeposited copper foil with its surface prepared, produced by the above process, and still further provides PWBs and a multilayer laminate of PWBs, produced with the use of the above electrodeposited copper foil with its surface prepared. The mechanical polishing followed by chemical polishing of the matte side enables obtaining an electrodeposited copper foil with its surface prepared, the matte side of which exhibits excellent properties, and hence enables obtaining PWBs and a multilayer PWBs which have excellent properties.
机译:一种制备表面已准备好的电沉积铜箔的方法,包括以下步骤:使具有光亮面和无光泽面的电沉积铜箔的平均表面粗糙度(Rz)为2.5至10μm。至少进行一次机械抛光,以使无光泽面的平均表面粗糙度(Rz)在1.5至3.0μm的范围内;对经过机械抛光的毛面进行选择性化学抛光,以使毛面的平均表面粗糙度(Rz)在0.8至2.5μm的范围内。本发明进一步提供了一种通过上述方法制备的,表面已准备好的电沉积铜箔,并且进一步提供了PWB和PWB的多层层压体,其是通过使用上述表面已制备的电沉积铜箔而制备的。在进行机械抛光之后,对无光泽面进行化学抛光,可以得到表面已准备好的电沉积铜箔,该铜箔的无光泽面表现出优异的性能,因此可以得到具有优异性能的PWB和多层PWB。

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