首页>
外国专利>
Method and apparatus for characterization of ultrathin silicon oxide films using mirror-enhanced polarized reflectance fourier transform infrared spectroscopy
Method and apparatus for characterization of ultrathin silicon oxide films using mirror-enhanced polarized reflectance fourier transform infrared spectroscopy
展开▼
机译:使用镜面增强的偏振反射傅里叶变换红外光谱法表征超薄氧化硅膜的方法和装置
展开▼
页面导航
摘要
著录项
相似文献
摘要
Ultrathin silicon oxide films thermally grown on Si (100) are characterized with Mirror-Enhanced Polarized Reflectance Fourier Transform Infrared spectroscopy (MEPR-FTIR). MEPR-FTIR is proposed to effectively probe properties of ultra-thin films. Using a mirror and a polarizer, MEPR-FTIR overcomes the difficulty of weak IR intensities normally encountered in ultrathin gate dielectrics such as SiO2 and the intensity of the silicon oxide longitudinal optical (LO) mode is found to increase by a factor of about 20. Therefore, FTIR spectrometers with sensitivity down to 0.01% may allow even sub-monolayer probing of silicon oxide on Si substrates.
展开▼