首页> 外国专利> ELECTRODEPOSITED COPPER FOIL WITH ITS SURFACE PREPARED, PROCESS FOR PRODUCING THE SAME AND USE THEREOF

ELECTRODEPOSITED COPPER FOIL WITH ITS SURFACE PREPARED, PROCESS FOR PRODUCING THE SAME AND USE THEREOF

机译:电镀铜箔及其表面,用于生产和使用铜箔的过程

摘要

A process for producing an electrodeposited copperfoil with its surface prepared, comprising the stepsof: subjecting an electrodeposited copper foil having ashiny side and a matte side whose average surfaceroughness (Rz) is in the range of 2.5 to 10 [err]m to atleast one mechanical polishing so that the averagesurface roughness (Rz) of the matte side becomes in therange of 1.5 to 3.0 [err]m; and subjecting the matte sidehaving undergone the mechanical polishing to aselective chemical polishing so that the averagesurface roughness (Rz) of the matte side becomes in therange of 0.8 to 2.5 [err]m. The invention further providesan electrodeposited copper foil with its surfaceprepared, produced by the above process, and stillfurther provides PWBs and a multilayer laminate of PWBs,produced with the use of the above electrodepositedcopper foil with its surface prepared. The mechanicalpolishing followed by chemical polishing of the matteside enables obtaining an electrodeposited copper foilwith its surface prepared, the matte side of whichexhibits excellent properties, and hence enablesobtaining PWBs and a multilayer PWBs which haveexcellent properties.
机译:生产电沉积铜的方法表面准备好的铝箔,包括以下步骤of:对具有以下特征的电沉积铜箔进行处理光泽面和磨砂面的平均表面粗糙度(Rz)在2.5至10 [err] m至至少进行一次机械抛光,使平均磨砂面的表面粗糙度(Rz)变为1.5至3.0 [err] m的范围;并让磨砂面经过机械抛光至选择性化学抛光,使平均磨砂面的表面粗糙度(Rz)变为范围为0.8到2.5 [err] m。本发明进一步提供表面有电沉积的铜箔用上述方法制备,生产的进一步提供PWB和PWB的多层层压板,使用上述电沉积生产表面已准备好的铜箔。机械的抛光,然后对磨砂进行化学抛光面能够获得电沉积铜箔表面准备好,其磨砂面表现出优异的性能,因此使获得具有以下特征的PWB和多层PWB:优良的性能。

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