首页> 外国专利> SUPPORTING BASE FOR GAS-PERMSELECTIVE MEMBRANE, SUPPORTING BASE FOR HYDROGEN-PERMSELECTIVE MEMBRANE, AND HYDROGEN-PERMSELECTIVE MEMBER USING THE SAME

SUPPORTING BASE FOR GAS-PERMSELECTIVE MEMBRANE, SUPPORTING BASE FOR HYDROGEN-PERMSELECTIVE MEMBRANE, AND HYDROGEN-PERMSELECTIVE MEMBER USING THE SAME

机译：气体-选择性渗透膜的支持基础，氢-选择性渗透膜的支持基础以及使用该方法的氢-选择性渗透膜的支持

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PROBLEM TO BE SOLVED: To provide a supporting base for a gas-permselective membrane which is a base for supporting a gas-permselective membrane and is made capable of easily jointed to e.g. a joint member while keeping its gas permeability, to provide a supporting base for a hydrogen-permselective membrane, and to provide a hydrogen-permselective member using the same.;SOLUTION: There are provided a supporting base for a gas-permseleetive membrane which is a supporting base for a gas-permselective membrane comprising a metallic porous sintered body and used for supporting a gas-permselective membrane, wherein the density of its jointing part is higher than that of its gas-permeation part; a supporting base for a hydrogen-permselective membrane, wherein the above metal is stainless steel, and the gas permeation part has a multilayer structure; and a hydrogen-permselective member using the support.;COPYRIGHT: (C)2002,JPO

机译：解决的问题：提供一种用于气体选择性渗透膜的支撑基体，该支撑基体是用于支撑气体选择性渗透膜的基体，并且使其能够容易地接合至例如。一种接头构件，同时保持其透气性，以提供用于氢渗透选择膜的支撑基础，并提供一种使用该支撑构件的氢渗透选择构件。一种用于透气选择性膜的支撑基底，其包括金属多孔烧结体，用于支撑透气选择性膜，其中，其结合部的密度高于其透气部的密度。氢选择性渗透膜的支撑基体，其中上述金属是不锈钢，并且气体渗透部分具有多层结构。 ;使用该支架的氢选择性渗透元件。;版权所有：（C）2002，日本特许厅

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公开/公告号JP2002219342A

专利类型
公开/公告日2002-08-06

原文格式PDF
申请/专利权人 KOBE STEEL LTD;
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申请/专利号JP20010022312
发明设计人 YASUNAGA TATSUYA;TOKUHIRA MASAYA;SATO TOSHIKI;HENMI YOSHIO;
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申请日2001-01-30
分类号B01D69/10;B01D71/02;B01J19/08;B22F3/11;B22F7/06;
国家 JP
入库时间 2022-08-22 00:54:53

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