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procedures for the development of a positive working fotoresists and entwicklungszusammensetzungen for
procedures for the development of a positive working fotoresists and entwicklungszusammensetzungen for
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机译:积极工作的摄影爱好者和摄影师的发展程序
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摘要
A method and composition for developing positive photoresists is illustrated. The developer of the present invention includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties.
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