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Evaporation apparatus, particularly adapted to an evaporation plant for forming thin layers on a substrate

机译:蒸发设备,特别适用于在基板上形成薄层的蒸发设备

摘要

An evaporation apparatus, particularly for forming thin metallization layers on a substrate, comprising a vacuum chamber (1) provided with an inlet opening or port (4) and an outlet opening or port (5), wherein the vacuum chamber comprises means (9) for transporting at least one substrate (8) from the inlet opening to the outlet opening, at least one evaporation source (11) being provided within the vacuum chamber; the evaporation source is movable inside the vacuum chamber, for directing a jet of vaporized material against the substrate in order to obtain a metallization layer.
机译:一种蒸发设备,特别是用于在基板上形成薄金属化层的蒸发设备,包括真空室(1),该真空室设有入口或端口(4)和出口或端口(5),其中该真空室包括装置(9)用于将至少一个基板(8)从入口传送到出口,在真空室内设有至少一个蒸发源(11);蒸发源可在真空室内移动,以将汽化材料的射流引向基板以获得金属化层。

著录项

  • 公开/公告号EP1136586A1

    专利类型

  • 公开/公告日2001-09-26

    原文格式PDF

  • 申请/专利权人 AGUASOLAR ADVANCES TECHNOLOGIES SA;

    申请/专利号EP20010105413

  • 发明设计人 REGITTNIG GERHARD;

    申请日2001-03-12

  • 分类号C23C14/24;C23C14/26;C23C14/56;

  • 国家 EP

  • 入库时间 2022-08-22 01:14:57

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