首页> 外国专利> CZ METHOD BASED, COOLER EQUIPPED SILICON SINGLE CRISTAL SILICON PULLING-UP DEVICE WITH IMPROVED EFFECT OF DEFECT DISPLACEMENT BY DASHNECK METHOD SILICON SINGLE CRYSTAL PULLING-UP DEVICE BASED ON CZ METHOD AND PROVIDED WITH COOLER, ENHANCED IN ELIMINATING DEFECT IN DASHNECK METHOD

CZ METHOD BASED, COOLER EQUIPPED SILICON SINGLE CRISTAL SILICON PULLING-UP DEVICE WITH IMPROVED EFFECT OF DEFECT DISPLACEMENT BY DASHNECK METHOD SILICON SINGLE CRYSTAL PULLING-UP DEVICE BASED ON CZ METHOD AND PROVIDED WITH COOLER, ENHANCED IN ELIMINATING DEFECT IN DASHNECK METHOD

机译:基于CZ方法的冷却器配备的硅单晶硅单晶硅上拉器件,通过Dashneck方法改善了缺陷的位移,改进了基于CZ方法的硅单晶硅的上拉器件,并提供了基于COLOLE的COOL焊点,并在直径上增加了尺寸

摘要

PROBLEM TO BE SOLVED: To provide a CZ method based single crystal pulling-up device which is equipped with a cooler in a CZ furnace and is enable to smoothly dislocate a silicon seed crystal.;SOLUTION: In this CZ method based single crystal pulling-up device, the cooler and a heat shelter are placed far from the surface of a melted solution in order to properly dislocate the silicon seed crystal in the dashneck method. This is based on the fact that the dislocation effect in the dashneck method is not obtained in a zone near to the cooler and the heat shelter.;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:提供一种基于CZ方法的单晶提拉装置,该装置在CZ炉中配备有冷却器,能够平稳地移动硅籽晶。解决方案:在此基于CZ方法的单晶提拉装置中,装置上,将冷却器和散热器放置在远离熔融溶液表面的位置,以便通过短颈法适当地移动硅籽晶。这是基于这样的事实,即在靠近冷却器和热屏蔽罩的区域中,无法获得达克方法中的位错效应。;版权所有:(C)2001,JPO

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