首页> 外国专利> CARBON NANOTUBE THIN FILM DEPOSITION ECR PLASMA CVD SYSTEM USING SLOT ANTENNA AND METHOD FOR DEPOSITING THE SAME THIN FILM

CARBON NANOTUBE THIN FILM DEPOSITION ECR PLASMA CVD SYSTEM USING SLOT ANTENNA AND METHOD FOR DEPOSITING THE SAME THIN FILM

机译:使用缝隙天线的碳纳米管薄膜沉积ECR等离子体CVD系统及沉积相同薄膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a carbon nanotube thin film deposition ECR plasma CVD system using a slot antenna which requires little labor, has high capacity of producing a carbon nanotube, low electric power consumption, and low production cost and to provide a method for depositing the same thin film. SOLUTION: In an ECR plasma CVD system, at least one slot antenna is disposed on the downstream side of a microwave generating system, and microwaves are introduced from the slot antenna into a film deposition chamber. By using this system, mixed ECR plasma of a carbon-containing gas and gaseous hydrogen is generated, and a carbon nanotube thin film is deposited uniformly on a substrate in the direction vertical to the substrate.
机译:解决的问题:提供一种使用缝隙天线的碳纳米管薄膜沉积ECR等离子体CVD系统,该系统需要很少的劳动,具有生产碳纳米管的能力高,功耗低,生产成本低的特点,并提供一种用于沉积相同的薄膜。解决方案:在ECR等离子CVD系统中,至少一个缝隙天线设置在微波发生系统的下游侧,并且微波从缝隙天线引入膜沉积室。通过使用该系统,产生了含碳气体和气态氢的混合ECR等离子体,并且在垂直于基板的方向上将碳纳米管薄膜均匀地沉积在基板上。

著录项

  • 公开/公告号JP2001295047A

    专利类型

  • 公开/公告日2001-10-26

    原文格式PDF

  • 申请/专利权人 ULVAC JAPAN LTD;

    申请/专利号JP20000108319

  • 发明设计人 AGAWA YOSHIAKI;YAMAGUCHI KOICHI;

    申请日2000-04-10

  • 分类号C23C16/26;B01J19/12;C01B31/02;C23C16/511;

  • 国家 JP

  • 入库时间 2022-08-22 01:32:32

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