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CARBON NANOTUBE THIN FILM DEPOSITION ECR PLASMA CVD SYSTEM USING SLOT ANTENNA AND METHOD FOR DEPOSITING THE SAME THIN FILM
CARBON NANOTUBE THIN FILM DEPOSITION ECR PLASMA CVD SYSTEM USING SLOT ANTENNA AND METHOD FOR DEPOSITING THE SAME THIN FILM
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机译:使用缝隙天线的碳纳米管薄膜沉积ECR等离子体CVD系统及沉积相同薄膜的方法
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摘要
PROBLEM TO BE SOLVED: To provide a carbon nanotube thin film deposition ECR plasma CVD system using a slot antenna which requires little labor, has high capacity of producing a carbon nanotube, low electric power consumption, and low production cost and to provide a method for depositing the same thin film. SOLUTION: In an ECR plasma CVD system, at least one slot antenna is disposed on the downstream side of a microwave generating system, and microwaves are introduced from the slot antenna into a film deposition chamber. By using this system, mixed ECR plasma of a carbon-containing gas and gaseous hydrogen is generated, and a carbon nanotube thin film is deposited uniformly on a substrate in the direction vertical to the substrate.
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