首页> 外国专利> ETCHING OF QUARTZ VIBRATING FRAGMENT, ETCHING DEVICE AND STORING CONTAINER OF QUARTZ FRAGMENT FOR ETCHING

ETCHING OF QUARTZ VIBRATING FRAGMENT, ETCHING DEVICE AND STORING CONTAINER OF QUARTZ FRAGMENT FOR ETCHING

机译:石英振动片的拉伸,蚀刻装置以及石英瓶的贮存容器

摘要

PROBLEM TO BE SOLVED: To provide a method and apparatus for etching a quartz vibration fragment by which the floating of the quartz fragment during the etching can be prevented without contaminating the environment, and the wholly homogeneous and highly accurate etching treatment can be carried out. SOLUTION: This method for carrying out the etching treatment of a quartz fragment 1 with an etching liquid 12 at least containing hydrofluoric acid comprises inserting the quartz fragment 1 into an etching vessel 11 storing the etching liquid 12 and immersing the quartz fragment 1 in the etching liquid 12 by a means 15 for compulsively immersing the quartz fragment 1 into the etching liquid. The quartz fragments 1 are preferably inserted into the etching liquid 12 according to the inserting order determined so as to correspond to the finishing ranks in a step for producing the quartz fragments 1.
机译:解决的问题:提供一种蚀刻石英振动片的方法和装置,通过该方法和装置,可以防止蚀刻过程中石英片的漂浮而不污染环境,并且可以进行完全均匀且高精度的蚀刻处理。解决方案:用至少包含氢氟酸的蚀刻液12对石英碎片1进行蚀刻处理的方法包括:将石英碎片1插入存储蚀刻液12的蚀刻容器11中,并将石英碎片1浸入蚀刻中通过将石英碎片1强制性地浸入蚀刻液中的装置15形成液体12。优选地,根据确定的插入顺序将石英碎片1插入到蚀刻液12中,以对应于在生产石英碎片1的步骤中的精加工等级。

著录项

  • 公开/公告号JP2001072497A

    专利类型

  • 公开/公告日2001-03-21

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20000000929

  • 发明设计人 SHIRAISHI SHIGERU;FUNATSU MORIMASA;

    申请日2000-01-06

  • 分类号C30B29/18;B65D85/38;C30B33/10;H01L21/306;H01L41/09;H03H3/02;

  • 国家 JP

  • 入库时间 2022-08-22 01:32:34

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