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Optical proximity correction mask for semiconductor device fabrication
Optical proximity correction mask for semiconductor device fabrication
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机译：用于半导体器件制造的光学邻近校正掩模
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摘要
A mask for fabricating a semiconductor device, which is capable of correcting an optical proximity effect, includes a transparent mask plate, a main pattern formed on the mask plate as a light blocking layer, and a subsidiary pattern a corner of which is offset in a direction of 45.+-.10 degrees or 135.+-.10 degrees from a line longitudinally extended from the main pattern's edge line. The corner of the subsidiary pattern may be contiguous or non-contiguous with a corner of the main pattern.
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