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APPARATUS FOR CONTROLLING FIXED QUANTITY OF CHEMICAL IN CHEMICAL TANK FOR PROCESSING OF WET ETCHING IN FABRICATION OF SEMICONDUCTOR DEVICE
APPARATUS FOR CONTROLLING FIXED QUANTITY OF CHEMICAL IN CHEMICAL TANK FOR PROCESSING OF WET ETCHING IN FABRICATION OF SEMICONDUCTOR DEVICE
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机译:用于控制制造半导体装置中的湿蚀刻过程的化学罐中化学物质的固定量的装置
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摘要
The present invention allows to arbitrarily adjust the amount of mixed solution of ultrapure water and chemical used in the wafer etching process, thereby eliminating the disadvantages caused by the replacement of the chemical metering tank and the possibility of safety accident.;To this end, the present invention receives the chemical from the central supply device (1), the chemical metering tank (3) having a drain line (2) for overflowing the chemical over a certain amount, and supplying a predetermined amount of the ultrapure water from the supply device A chemical feeding system for wafer etching comprising a mixing tank (4) receiving a quantity of the chemical supply tank while receiving; In the chemical metering tank (3), a wet etching process for manufacturing a semiconductor device, characterized in that the quantitative control means for controlling the quantification of the chemical by providing a linear movement into the space filled with the chemical is provided A metering tank is provided.
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