首页> 外国专利> APPARATUS FOR CONTROLLING FIXED QUANTITY OF CHEMICAL IN CHEMICAL TANK FOR PROCESSING OF WET ETCHING IN FABRICATION OF SEMICONDUCTOR DEVICE

APPARATUS FOR CONTROLLING FIXED QUANTITY OF CHEMICAL IN CHEMICAL TANK FOR PROCESSING OF WET ETCHING IN FABRICATION OF SEMICONDUCTOR DEVICE

机译:用于控制制造半导体装置中的湿蚀刻过程的化学罐中化学物质的固定量的装置

摘要

The present invention allows to arbitrarily adjust the amount of mixed solution of ultrapure water and chemical used in the wafer etching process, thereby eliminating the disadvantages caused by the replacement of the chemical metering tank and the possibility of safety accident.;To this end, the present invention receives the chemical from the central supply device (1), the chemical metering tank (3) having a drain line (2) for overflowing the chemical over a certain amount, and supplying a predetermined amount of the ultrapure water from the supply device A chemical feeding system for wafer etching comprising a mixing tank (4) receiving a quantity of the chemical supply tank while receiving; In the chemical metering tank (3), a wet etching process for manufacturing a semiconductor device, characterized in that the quantitative control means for controlling the quantification of the chemical by providing a linear movement into the space filled with the chemical is provided A metering tank is provided.
机译:本发明允许任意调节晶片蚀刻工艺中使用的超纯水和化学药品的混合溶液的量,从而消除了由于更换化学药品计量罐而引起的缺点以及安全事故的可能性。本发明从中央供应设备(1)接收化学药品,化学药品计量罐(3)具有用于使化学药品溢出一定量并从供应设备供应预定量的超纯水的排放管线(2)。一种用于晶片蚀刻的化学进料系统,包括:混合槽(4),同时接收一定量的化学药品供应槽;在化学药品计量罐(3)中,一种用于制造半导体器件的湿蚀刻工艺,其特征在于,提供了一种定量控制装置,该定量控制装置通过在填充有化学药品的空间中进行线性运动来控制化学药品的定量。提供。

著录项

  • 公开/公告号KR200177067Y1

    专利类型

  • 公开/公告日2000-04-15

    原文格式PDF

  • 申请/专利权人 HYUNDAI MICRO ELECTRONICS CO.LTD.;

    申请/专利号KR19970036789U

  • 发明设计人 김병희;

    申请日1997-12-12

  • 分类号H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-22 01:44:18

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