首页> 外国专利> LIGHT INTERFERENCE-TYPE MEASURING DEVICE, WORKING DEVICE PROVIDED WITH THE MEASURING DEVICE, WORKING TOOL APPLIED TO THE WORKING DEVICE AND LIGHT INTERFERENCE-TYPE MEASURING METHOD

LIGHT INTERFERENCE-TYPE MEASURING DEVICE, WORKING DEVICE PROVIDED WITH THE MEASURING DEVICE, WORKING TOOL APPLIED TO THE WORKING DEVICE AND LIGHT INTERFERENCE-TYPE MEASURING METHOD

机译:光干涉式测量装置,由该测量装置提供的工作装置,应用于该工作装置的工作工具和光干涉式测量方法

摘要

PROBLEM TO BE SOLVED: To enable light interference measurement even in a rough surface state of a work under working operation. ;SOLUTION: A work 50 is supported by an XY table 4. First, a milling machine tool 16 is fixed on Z-axis spindle 8 and milling machining is performed. During the machining, a measuring jig 12 is fixed on the Z-axis spindle 8. As the measuring jig 12 rotates, a application member 20 of jig bottom spreads measuring liquid on a work to form uniform film. An interference meter 24 irradiates light on the skin through a measuring window of the measuring jig 12 to perform light interference measurement of the film surface. Even in the coarse surface of machining, the surface of the film is smooth so that interference pattern is produced because of the smooth surface and the surface shape of the machined surface can be known. After controlling the working conditions according to the measured results, milling is continued.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:即使在工作操作中的粗糙表面状态下,也可以进行光干扰测量。 ;解决方案:工件50由XY工作台4支撑。首先,将铣床16固定在Z轴主轴8上并执行铣削加工。在加工过程中,将测量夹具12固定在Z轴主轴8上。随着测量夹具12旋转,夹具底部的施加构件20在工件上散布测量液体以形成均匀的膜。干涉仪24通过测量夹具12的测量窗向皮肤照射光,以进行膜表面的光干涉测量。即使在加工的粗糙表面上,膜的表面也是光滑的,从而由于光滑的表面和加工表面的表面形状而产生干涉图案。根据测量结果控制工作条件后,继续研磨。版权所有:(C)1999,日本特许厅

著录项

  • 公开/公告号JPH1144514A

    专利类型

  • 公开/公告日1999-02-16

    原文格式PDF

  • 申请/专利权人 MITSUTOYO CORP;

    申请/专利号JP19970219312

  • 发明设计人 HANDA HIROHISA;

    申请日1997-07-29

  • 分类号G01B11/24;B23Q17/24;B24B37/00;G01B9/02;

  • 国家 JP

  • 入库时间 2022-08-22 02:35:23

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