首页> 外国专利> IN-PROCESS LIGHT INTERFERENCE TYPE MEASURING APPARATUS FOR WORKING AND WORKING DEVICE EQUIPPED WITH THE SAME, AND WORKING TOOL SUITABLE FOR IN-PROCESS LIGHT MEASUREMENT

IN-PROCESS LIGHT INTERFERENCE TYPE MEASURING APPARATUS FOR WORKING AND WORKING DEVICE EQUIPPED WITH THE SAME, AND WORKING TOOL SUITABLE FOR IN-PROCESS LIGHT MEASUREMENT

机译:用于工作和工作装置的过程中光干扰类型测量设备,以及用于该过程中光测量的工作工具

摘要

PROBLEM TO BE SOLVED: To provide an interference fringe type measuring apparatus by which a shape of a surface of an object to be worked can be measured precisely during working, that is, in process. ;SOLUTION: A workpiece 11 is mounted on a working mechanism base 3, and a lapping disk 5 set on the workpiece 11 is rotary driven. A lapping liquid is supplied between the lapping disk 5 and the workpiece 11. The lapping disk 5 is provided with a plurality of through-holes as measuring windows 9. Above the workpiece 11 an interferometer is installed across the lapping disk 5. The interferometer detects the interference fringes on a working surface of the workpiece 11 through the measuring windows. The rotational control of the lapping disk 5 and the position control of the workpiece 11 are conducted, based on the detection results.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:提供一种干涉条纹型的测量装置,通过该干涉型的测量装置,可以在加工过程中,即在加工过程中精确地测量待加工物体的表面形状。 ;解决方案:将工件11安装在工作机构基座3上,并旋转驱动放置在工件11上的研磨盘5。在研磨盘5和工件11之间供给研磨液。研磨盘5具有多个作为测量窗9的通孔。在工件11上方,在研磨盘5上安装有干涉仪。干涉条纹通过测量窗在工件11的工作面上。根据检测结果,进行研磨盘5的旋转控制和工件11的位置控制。COPYRIGHT:(C)1999,JPO

著录项

  • 公开/公告号JPH1114305A

    专利类型

  • 公开/公告日1999-01-22

    原文格式PDF

  • 申请/专利权人 MITSUTOYO CORP;

    申请/专利号JP19970187763

  • 发明设计人 HANDA HIROHISA;

    申请日1997-06-26

  • 分类号G01B9/02;B24B37/04;

  • 国家 JP

  • 入库时间 2022-08-22 02:35:47

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