CHEMICAL SOLUTIONS FOR REMOVING METAL-COMPOUND CONTAMINANTS FROM WAFERS AFTER CMP AND THE METHOD OF WAFER CLEANING

• 1. 一种去除硅片金属杂质的方法 [P] . 中国专利： CN103871871A . 2014-06-18
• 2. 碱性有机腐蚀溶液和利用碱性有机腐蚀溶液去除硅片表面纳米级损伤层的方法 [P] . 中国专利： CN102719827A . 2012-10-10
• 3. CHEMICAL SOLUTIONS FOR REMOVING METAL-COMPOUND CONTAMINANTS FROM WAFERS AFTER CMP AND THE METHOD OF WAFER CLEANING [P] . 欧洲知识产权局专利： EP0811244A1 . 1997-12-10

  机译： CMP后去除硅片中金属杂质的化学溶液及硅片清洗方法

• 4. Chemical solutions for removing metal-compound contaminants from wafers after CMP and the method of wafer cleaning [P] . 美国专利： US5662769A . 1997-09-02

  机译： CMP后从晶片上去除金属化合物污染物的化学溶液和晶片清洗方法

• 5. A cleaning method of a semiconductor wafer using an improved cleaning solution and a cleaning solution for removing metallic contaminants and organic contaminants from a semiconductor wafer [P] . 韩国专利： KR960043002A . 1996-12-21

  机译： 使用改进的清洗液和用于从半导体晶片去除金属污染物和有机污染物的清洗液的半导体晶片的清洗方法

• 1. Removing contaminants from wafer edge, back side and hydrophobic front side in Post-CMP cleaning systems [C] . Michael Ravkin, John de Larios, Jeffrey Farber Twentieth International Vlsi Multilevel Interconnection Conference (VMIC); Sep 23-25, 2003; Marina del Rey, California . 2003
• 2. Statistical analysis and sensor based modeling of electrochemical mechanical polishing (ECMP) of Cu blanket wafer for semiconductor applications. [D] . Ravichandran, Sakthi Jaya Rahul. 2013
• 3. PMMA-Etching-Free Transfer of Wafer-scale Chemical Vapor Deposition Two-dimensional Atomic Crystal by a Water Soluble Polyvinyl Alcohol Polymer Method [O] . Huynh Van Ngoc, Yongteng Qian, Suk Kil Han, -1
• 4. Influence of Wafer Edge Profile on STI-CMP Process Performance : Examination Based on Surface Pressure of Wafer Calculated by FEM Analysis(Machine Elements, Design and Manufacturing) [O] . Akira FUKUDA, Tetsuo FUKUDA, Hirokuni HIYAMA, 2010
• 5. Wafer Cleaning and Pre-Bonding Module for Wafer Bonding [R] . Mishra, U., Witt, G. L. 2007

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• 2. Limitations of On-Wafer Calibration and De-Embedding Methods in the Sub-THz Range [J] . Manuel Potereau ,Christian Raya ,Magali De Matos . 电脑和通信（英文） . 2013,第6期
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