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Langmuir probe system for radio frequency excited plasma processing system
Langmuir probe system for radio frequency excited plasma processing system
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机译：用于射频激发等离子体处理系统的Langmuir探针系统
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摘要
A Langmuir probe system for measuring plasma internal discharge parameters in a radio frequency excited plasma processing system includes an electrically tuned resonant circuit. The electrically tuned resonant circuit includes a semiconductor variable capacitor. Specifically, an inductor and FET are connected in parallel to form a resonant circuit used to electrically tune the Langmuir probe. The tuning circuit is placed within a moveable, electrically floating, probe housing and is electrically tuned to improve tuning accuracy and to reduce detuning during operation.
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