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METHOD OF METAL HYDRIDE FILM APPLYING IN VACUUM, APPLICATION OF METAL HYDRIDE FILM, PRODUCED BY THE METHOD OF ITEM 1, AND APPLICATION OF SUBSTRATUM WITH METAL HYDRIDE FILM, PRODUCED BY THE METHOD OF ITEM 1
METHOD OF METAL HYDRIDE FILM APPLYING IN VACUUM, APPLICATION OF METAL HYDRIDE FILM, PRODUCED BY THE METHOD OF ITEM 1, AND APPLICATION OF SUBSTRATUM WITH METAL HYDRIDE FILM, PRODUCED BY THE METHOD OF ITEM 1
the invention u043eu0442u043du043eu0441u0438u0442u0441u00a0 receivable u0433u0438u0434u0440u0438u0440u043eu0432u0430u043du043du044bu0445 u0433u043eu043cu043eu0433u0435u043du043du044bu0445 and stable films of titanium or other metals, containing a large amount of hydrogen u0441u0443u0431u0441u0442u0440 ata, which can be u043fu0440u043eu0432u043eu0434u00a0u0449u0438u043c, u043fu043eu043bu0443u043fu0440u043eu0432u043eu0434u00a0u0449u0438u043c and u0438u0437u043eu043bu00a0u0446u0438u043eu043du043du044bu043c material.the invention discloses a low-temperature plasma process consistent u043eu0441u0430u0436u0434u0435u043du0438u00a0 metal film and its film u043fu0440u0435u0432u0440u0430u0449u0435u043du0438u00a0 hydride a metal u043eu0431u0440u0430u0431u0430u0442u044bu0432u0430u00a0 its hydrogen plasma. using this method on metal, glass or plastics material may be u043eu0441u0430u0436u0434u0435u043du044b u0433u043eu043cu043eu0433u0435u043du043du044bu0435 and stable film u0433u0438u0434u0440u0438u0434u0430 titanium, u043fu0430u043bu043bu0430u0434u0438u00a0, u0432u0430u043du0430u0434u0438u00a0, circus u043eu043du0438u00a0. 2. and 6 z.s - lu, 2 table.
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