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ADHESION PROMOTION IN PHOTORESIST LAMINATION AND PROCESSING
ADHESION PROMOTION IN PHOTORESIST LAMINATION AND PROCESSING
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机译:光刻胶层压和加工中的粘合促进
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摘要
Use of a photoresist is improved due to increased adhesive to a substrate through an additive in the resist of a condensation polymer of formaldehyde, toluene sulfonamide and either a triazine such as melamine or hydantoin.
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