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Electromechanical strain gauge and mfg. method - has minimal thickness dielectric layer deposited on sensitive component and grid engraved in resistive sheet glued on dielectric
Electromechanical strain gauge and mfg. method - has minimal thickness dielectric layer deposited on sensitive component and grid engraved in resistive sheet glued on dielectric
The strain gauge is formed by a resistive grid (9) which is fixed on a sensitive component (1). On this sensitive component (1), a dielectric (8) is deposited under vacuum. The thickness of the dielectric (8) is the miminum compatible with the insulation voltages required. A sheet of resistive material is glued on the dielectric (8) and the grid (9) is engraved 'in situ' on this resistive material. The sensitive component (1) is polished before the dielectric (8) is applied. The sensitive component (1) may be made from a metal, a metallic alloy, or a carbon, vitreous carbon, polycrystal graphite, carbon-carbon, ceramic or polymer based material. The dielectric (8) is made from silica, alumina etc. The grid (9) is made from a metal, metallic alloy or conductive mineral. 6+6A.
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