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Schottky FET on semiconductor substrate - has specified gate width attained experimentally from model whose measuring permits calculation of characteristic coefft.

机译:半导体衬底上的肖特基FET-已通过模​​型测量得出了指定的栅极宽度,该模型的测量结果允许计算特性系数。

摘要

The field-effect transistor has a Schottky gate electrode between source and drain. The gate width (W) satisfies a specified relation which contains a coefficient alpha characteristic for the geometry and material of the device, and is experimentally determined by making a model of a Schottky field-effect transistor with the specified geometry and specified doping. Then the field-effect transistor maximum stable gain esp. for different test frequencies is measured, and the theoretical value for the test frequency is calculated. The coefficient alpha is calculated from a specified equation. When using gallium arsenide or semiconductor material, the gate width value is satisfies a specified term.
机译:场效应晶体管在源极和漏极之间具有肖特基栅电极。栅极宽度(W)满足指定的关系,该关系包含器件的几何形状和材料的系数alpha特性,并且通过制作具有指定几何形状和指定掺杂的肖特基场效应晶体管模型来实验确定。然后,场效应晶体管的最大稳定增益为esp。测量不同测试频率的频率,并计算出测试频率的理论值。系数alpha是根据指定的公式计算得出的。使用砷化镓或半导体材料时,栅极宽度值满足规定条件。

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