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High Performance Interference Patterning Device Using Higher Harmonic Wave Source
High Performance Interference Patterning Device Using Higher Harmonic Wave Source
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机译:高性能干扰图案化装置使用高谐波源
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摘要
The present invention relates to a high-performance interference patterning apparatus using a high-order harmonic light source, comprising: a light source means, and a grating pair arranged to form an interference image by diffracting light irradiated from the light source means. And, the interference image obtained by interfering the diffracted light from the grating pair is incident on the resist-coated sample surface to generate an interference pattern.
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