High Performance Interference Patterning Device Using Higher Harmonic Wave Source

• 1. 使用激光图案化制造阴影掩膜的装置和使用激光图案化制造阴影掩膜的方法 [P] . 中国专利： CN107427964B . 2019.06.25
• 2. 使用激光图案化制造阴影掩膜的装置和使用激光图案化制造阴影掩膜的方法 [P] . 中国专利： CN107427964A . 2017-12-01
• 3. High Performance Interference Patterning Device Using Higher Harmonic Wave Source [P] . KR20210029437A . 2021-03-16

  机译： 高性能干扰图案化装置使用高谐波源

• 4. INTERFERENCE MODULATOR AND HARMONIC WAVE LIGHT SOURCE USING IT [P] . 日本专利： JP2004212824A . 2004-07-29

  机译： 干扰调制器和使用它的谐波波光源

• 5. Optical arrangement for use in laser for spectroscopic purposes, has flanks that are designed such that for wave length of light source, orthogonal interference pattern has integer multiple of interference periods on flanks [P] . 德国专利： DE102012208772A1 . 2013-11-28

  机译： 用于光谱用途的激光器中的光学装置具有侧面，该侧面被设计成使得对于光源的波长，正交干涉图案在侧面上具有干涉周期的整数倍。

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